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Gocage Figure 1 on the left shows the method when a freezing material is used and figure 2 shows the method when a self-freezing photoresist is used. Introduction to Microelectronic Fabrication 2nd ed. From Wikipedia, the free encyclopedia. JSR offers many solutions to its customers depending on their chosen manufacturing processes and methods, such as combining freezing materials with leading-edge ArF photoresists, or combining self-freezing ArF photoresists with the TCX topcoat series which have become an industry standard for immersion exposure, and the newly-developed non-topcoat self-freezing ArF photoresist refer to reference material 2. Modern techniques using excimer laser lithography already print features with dimensions a fraction of the wavelength of light used — an amazing optical feat. Photolithography — Wikipedia Mitsunobu Koshiba announced today that it has developed a non-topcoat self-freezing ArF photoresist for double patterning a next-generation semiconductor manufacturing process used for 32nm half-pitch node and beyondachieving 26nm half-pitch line and space patterns refer to reference material 1.

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